Drix supplies blank (unpatterned) gobo’s without photoresist for laser ablation, and with photoresist for photchemical etching.
Photochemical etching allows image transfer with very high resolution and excellent image consistency.
It requires a photosetter and a small lab to accomplish this.
On this page you find some documents describing how to process the blank gobo’s photochemically.
Drix offers an exposure unit to copy the film image to the gobo at very high resolution.
This exposure unit generates a well collimated UV/blue light beam so that even with a small distance between film and gobo the image resolution is still preserved.
Since there is no need to apply force between gobo and film, generation of pinholes due to hard film contact can be avoided.